Ponente
Descripción
Nanostructured PbS thin films were deposited on BK7 substrates at room temperature by radio frequency sputtering technique varying the deposition power from 50 to 150 W while keeping constant other deposition parameters (Argon flow at 80 sccm for 30 min). X-ray diffraction (XRD) data show that all films are polycrystalline having a preferential orientation along the (200) direction. Atomic force microscopy (AFM) evidences that the films present a nanostructured growth, with particle size between 6 and 8 nm. Rutherford backscattering spectroscopy (RBS) data show that for films deposited at P≤ 90 W the elemental composition of the films depends on deposition power, rising the sputtering power from 50 to 90 W increases the atomic concentration of S and decreases that of Pb. For films deposited at P > 90 W, no dependence of the elemental concentration on sputtering power was observed. The radiation behaviour of the films has been characterized by in-situ optical measurements. To do that the transmittance and reflectance of the films were monitored as a function of fluence during H irradiation at energy of 3 MeV (simulating the space conditions) for future solar cells application.